Invention Grant
- Patent Title: Real-time formation of optimal power spectral density masks
- Patent Title (中): 实时形成最优功率谱密度掩模
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Application No.: US11031020Application Date: 2005-01-10
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Publication No.: US07974583B2Publication Date: 2011-07-05
- Inventor: Patrick Duvaut , Feng Ouyang
- Applicant: Patrick Duvaut , Feng Ouyang
- Applicant Address: US CA Fremont
- Assignee: Ikanos Communications, Inc.
- Current Assignee: Ikanos Communications, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Thomas, Kayden, Horstemeyer & Risley, LLP
- Main IPC: H04B7/00
- IPC: H04B7/00

Abstract:
A technique for real-time formation of optimal power spectral density masks is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for real-time formation of optimal power spectral density masks. The method may comprise sensing line conditions in a communication medium, wherein the communication medium is capable of carrying signals in a plurality of tones. The method may also comprise determining, in real-time, one or more power spectral density masks that substantially optimize transmissions of the signals in the plurality of tones. The method may further comprise transmitting the signals in the plurality of tones based on the one or more power spectral masks.
Public/Granted literature
- US20050152442A1 Real-time formation of optimal power spectral density masks Public/Granted day:2005-07-14
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