Invention Grant
- Patent Title: Thin film magnetic device and method of manufacturing the same
- Patent Title (中): 薄膜磁性装置及其制造方法
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Application No.: US12010714Application Date: 2008-01-29
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Publication No.: US07973630B2Publication Date: 2011-07-05
- Inventor: Taku Masai , Ryuji Hashimoto
- Applicant: Taku Masai , Ryuji Hashimoto
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-022354 20070131
- Main IPC: H01F5/00
- IPC: H01F5/00 ; H01F17/04 ; H01F17/00 ; H01F27/28 ; H01L29/66 ; H01L29/82 ; H01L29/00 ; G05F1/00

Abstract:
A thin film magnetic device is provided, in which magnetic permeability in a high frequency range can be easily improved. Scratch-like grooves extending along an extending direction of a coil (for example, a Y-axis direction being an extending direction of a second coil part) are formed at least one side of a surface and a back of each of a lower magnetic film and an upper magnetic film. A magnetization direction of anisotropic magnetization is controlled in each of formation areas of the scratch-like grooves (formation areas of lower magnetic films and upper magnetic films), and therefore displacement (rotation) of the magnetization direction of the anisotropic magnetization is pinned by the scratch-like grooves. Consequently, certain magnetic permeability is kept even in a high frequency range. Moreover, such formation of the scratch-like grooves may not cause complexity in manufacturing process.
Public/Granted literature
- US20090045899A1 Thin film magnetic device and method of manufacturing the same Public/Granted day:2009-02-19
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