Invention Grant
US07973375B2 Spin transistor and method of manufacturing same 有权
旋转晶体管及其制造方法

  • Patent Title: Spin transistor and method of manufacturing same
  • Patent Title (中): 旋转晶体管及其制造方法
  • Application No.: US12201245
    Application Date: 2008-08-29
  • Publication No.: US07973375B2
    Publication Date: 2011-07-05
  • Inventor: Keiji Koga
  • Applicant: Keiji Koga
  • Applicant Address: JP Tokyo
  • Assignee: TDK Corporation
  • Current Assignee: TDK Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2007-229199 20070904
  • Main IPC: H01L29/00
  • IPC: H01L29/00
Spin transistor and method of manufacturing same
Abstract:
The spin transistor in accordance with the present invention comprises a magnetoresistive element having a fixed layer, a free layer, and a semiconductor layer provided between the fixed layer and free layer; a source electrode layer electrically connected to one end face in a laminating direction of the magnetoresistive element; a drain electrode layer electrically connected to the other end face in the laminating direction of the magnetoresistive element; and a gate electrode layer laterally adjacent to the semiconductor layer through a gate insulating layer provided on a side face of the semiconductor layer.
Public/Granted literature
Information query
Patent Agency Ranking
0/0