Invention Grant
- Patent Title: Spin transistor and method of manufacturing same
- Patent Title (中): 旋转晶体管及其制造方法
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Application No.: US12201245Application Date: 2008-08-29
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Publication No.: US07973375B2Publication Date: 2011-07-05
- Inventor: Keiji Koga
- Applicant: Keiji Koga
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-229199 20070904
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
The spin transistor in accordance with the present invention comprises a magnetoresistive element having a fixed layer, a free layer, and a semiconductor layer provided between the fixed layer and free layer; a source electrode layer electrically connected to one end face in a laminating direction of the magnetoresistive element; a drain electrode layer electrically connected to the other end face in the laminating direction of the magnetoresistive element; and a gate electrode layer laterally adjacent to the semiconductor layer through a gate insulating layer provided on a side face of the semiconductor layer.
Public/Granted literature
- US20090057793A1 SPIN TRANSISTOR AND METHOD OF MANUFACTURING SAME Public/Granted day:2009-03-05
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