Invention Grant
- Patent Title: Semiconductor integrated circuit device including static random access memory having diffusion layers for supplying potential to well region
- Patent Title (中): 半导体集成电路器件包括具有用于向阱区供电的扩散层的静态随机存取存储器
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Application No.: US12285166Application Date: 2008-09-30
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Publication No.: US07973371B2Publication Date: 2011-07-05
- Inventor: Hiroshi Furuta , Junji Monden , Ichiro Mizuguchi
- Applicant: Hiroshi Furuta , Junji Monden , Ichiro Mizuguchi
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2007-262024 20071005
- Main IPC: H01L31/119
- IPC: H01L31/119

Abstract:
A static random access memory (SRAM) cell includes a first well region of a first conductivity type, a second well region of the first conductivity type, formed in a location different from a location where the first well region is formed, and a third well region of a second conductivity type, which is located between the first well region and the second well region. The memory cell further includes a first tap diffused layer of the first conductivity type for supplying a potential to the first well region, a second tap diffused layer of the first conductivity type for supplying the potential to the second well region, the first and second tap diffused layers being arranged substantially on a diagonal line in the layout of the SRAM cell, and a metal interconnection connected to the first and second tap diffused layers, the metal interconnection passing on the third well region in the SRAM cell.
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