Invention Grant
- Patent Title: Memory cell device with coplanar electrode surface and method
- Patent Title (中): 具有共面电极表面和方法的记忆单元器件
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Application No.: US12576819Application Date: 2009-10-09
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Publication No.: US07972895B2Publication Date: 2011-07-05
- Inventor: Hsiang-Lan Lung
- Applicant: Hsiang-Lan Lung
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L21/06
- IPC: H01L21/06

Abstract:
A memory device described herein includes a bit line having a top surface and a plurality of vias. The device includes a plurality of first electrodes each having top surfaces coplanar with the top surface of the bit line, the first electrodes extending through corresponding vias in the bit line. An insulating member is within each via and has an annular shape with a thickness between the corresponding first electrode and a portion of the bit line acting as a second electrode. A layer of memory material extends across the insulating members to contact the top surfaces of the bit line and the first electrodes.
Public/Granted literature
- US20100029042A1 MEMORY CELL DEVICE WITH COPLANAR ELECTRODE SURFACE AND METHOD Public/Granted day:2010-02-04
Information query
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