Invention Grant
- Patent Title: Method of manufacturing magnetic recording medium
- Patent Title (中): 磁记录介质的制造方法
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Application No.: US12509261Application Date: 2009-07-24
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Publication No.: US07972523B2Publication Date: 2011-07-05
- Inventor: Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant: Kaori Kimura , Yousuke Isowaki , Yoshiyuki Kamata , Masatoshi Sakurai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2008-192536 20080725
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a magnetic recording layer, an oxidation inhibiting layer, a hard mask layer includes carbon on a substrate, coating the hard mask layer with a resist, transferring patterns of protrusions and recesses to the resist by imprinting to form resist patterns, sequentially performing etching of the hard mask layer using the resist patterns as masks, etching of the oxidation inhibiting layer, and etching and/or magnetism deactivation of the magnetic recording layer to form patterns of the magnetic recording layer, and sequentially performing stripping of the resist patterns, stripping of the hard mask layer and stripping of the oxidation inhibiting layer, in which ion beam etching is used for stripping the oxidation inhibiting layer.
Public/Granted literature
- US20100018947A1 METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM Public/Granted day:2010-01-28
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