Invention Grant
- Patent Title: Method of producing polishing pad
- Patent Title (中): 抛光垫的生产方法
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Application No.: US11859928Application Date: 2007-09-24
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Publication No.: US07972396B2Publication Date: 2011-07-05
- Inventor: Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
- Applicant: Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
- Applicant Address: TW Kaoshiung
- Assignee: San Fang Chemical Industry Co., Ltd.
- Current Assignee: San Fang Chemical Industry Co., Ltd.
- Current Assignee Address: TW Kaoshiung
- Agency: Sughrue Mion, PLLC
- Main IPC: B24D3/34
- IPC: B24D3/34

Abstract:
The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
Public/Granted literature
- US20080047205A1 METHOD OF PRODUCING POLISHING PAD Public/Granted day:2008-02-28
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