Invention Grant
US07958478B2 Production method, design method and design system for semiconductor integrated circuit
有权
半导体集成电路的制作方法,设计方法和设计系统
- Patent Title: Production method, design method and design system for semiconductor integrated circuit
- Patent Title (中): 半导体集成电路的制作方法,设计方法和设计系统
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Application No.: US12216795Application Date: 2008-07-10
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Publication No.: US07958478B2Publication Date: 2011-06-07
- Inventor: Toshiyuki Saito , Tetsuo Yoshino
- Applicant: Toshiyuki Saito , Tetsuo Yoshino
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2007-182664 20070711
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F9/455

Abstract:
A production method for a semiconductor integrated circuit includes: creating a model parameter of an element constituting a cell, wherein the model parameter is defined by a design value and a distribution function of variability from the design value; performing a circuit simulation using the model parameter to create a response function that expresses response of cell characteristic to the model parameter; and creating a statistical cell library by using the response function. The statistical cell library used for circuit design and verification gives an expected value and statistical variation of the cell characteristic. The statistical variation is expressed by a product of the distribution function and sensitivity. The sensitivity is calculated based on the response function. When the model parameter is updated, the statistical cell library is updated by using the post-update model parameter and the response function without performing a circuit simulation.
Public/Granted literature
- US20090019408A1 Production method, design method and design system for semiconductor integrated circuit Public/Granted day:2009-01-15
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