Invention Grant
- Patent Title: Two-stage laser system for aligners
- Patent Title (中): 对准器的两级激光系统
-
Application No.: US11566235Application Date: 2006-12-03
-
Publication No.: US07957449B2Publication Date: 2011-06-07
- Inventor: Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
- Applicant: Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
- Applicant Address: JP Tokyo
- Assignee: Komatsu Ltd.
- Current Assignee: Komatsu Ltd.
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Main IPC: H01S3/083
- IPC: H01S3/083

Abstract:
The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
Public/Granted literature
- US20070297483A1 TWO-STAGE LASER SYSTEM FOR ALIGNERS Public/Granted day:2007-12-27
Information query