Invention Grant
- Patent Title: Measurement apparatus for measuring transmittance distribution of optical system
- Patent Title (中): 用于测量光学系统的透射率分布的测量装置
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Application No.: US12258496Application Date: 2008-10-27
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Publication No.: US07956994B2Publication Date: 2011-06-07
- Inventor: Naoto Hayashi
- Applicant: Naoto Hayashi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc., I.P. Division
- Priority: JP2007-283792 20071031
- Main IPC: G01J1/00
- IPC: G01J1/00 ; G01B9/02

Abstract:
A measurement apparatus which measures a transmittance distribution of an optical system, comprises a light source, a first spherical mirror which forms reference light by reflecting light which is emitted by the light source and is not transmitted through the optical system, a second spherical mirror which forms test light by reflecting light which is emitted by the light source and is transmitted through the optical system, a measurement unit which measures intensity distributions of the reference light and the test light, a unit which calculates reflectance distributions of the first spherical mirror and the second spherical mirror, and an arithmetic unit which calculates a transmittance distribution on a pupil plane of the optical system, on the basis of the intensity distributions of the reference light and the test light, and the reflectance distributions of the first spherical mirror and the second spherical mirror.
Public/Granted literature
- US20090109439A1 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-04-30
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