An exposure apparatus includes a driver used for one of height, inclination, curvature-of-field, magnification, and rotation corrections, and a controller configured to control a substrate stage so that it can change an exposure area from a first shot to a third shot even if a moving distance of the substrate stage from the first shot to the second shot is smaller than that from the first shot to the third shot, if a time period necessary for the driver to transfer from a correction state for the first shot to a correction state for the second shot is longer than a time period necessary for the substrate stage to move the exposure area from the first shot to the second shot, and a time period necessary for the driver to transfer from a correction state for the first shot to a correction state for the third shot.