Invention Grant
US07956715B2 Thin film structures with negative inductance and methods for fabricating inductors comprising the same
有权
具有负电感的薄膜结构和用于制造包括该电感的电感器的方法
- Patent Title: Thin film structures with negative inductance and methods for fabricating inductors comprising the same
- Patent Title (中): 具有负电感的薄膜结构和用于制造包括该电感的电感器的方法
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Application No.: US12427296Application Date: 2009-04-21
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Publication No.: US07956715B2Publication Date: 2011-06-07
- Inventor: Agus Widjaja , Andrew Sarangan
- Applicant: Agus Widjaja , Andrew Sarangan
- Applicant Address: US OH Dayton
- Assignee: University of Dayton
- Current Assignee: University of Dayton
- Current Assignee Address: US OH Dayton
- Agency: Dinsmore & Shohl LLP
- Main IPC: H01F5/00
- IPC: H01F5/00 ; H01F27/02 ; H01F27/28 ; H01L27/08

Abstract:
An inductor structure comprising a substrate and a planar conductor structure on a surface of the substrate, and methods for fabricating an inductor structure. The planar conductor structure may comprise a vertical stack of three or more multilayer films. Each multilayer film may comprise a first layer of a first metal, defining a first vertical thickness, and a second layer of a second metal, defining a second vertical thickness. The metals and thicknesses are chosen such that the inductor exhibits a negative electrical self-inductance when an electrical signal is transmitted from a first contact point to a second contact point.
Public/Granted literature
- US20090261936A1 THIN FILM STRUCTURES WITH NEGATIVE INDUCTANCE AND METHODS FOR FABRICATING INDUCTORS COMPRISING THE SAME Public/Granted day:2009-10-22
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