Invention Grant
- Patent Title: Preparation method of hollow particle
- Patent Title (中): 中空颗粒的制备方法
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Application No.: US12043305Application Date: 2008-03-06
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Publication No.: US07956147B2Publication Date: 2011-06-07
- Inventor: Aya Shirai , Mitsutoshi Nakamura , Tatsuya Nagase , Motoi Nishimura
- Applicant: Aya Shirai , Mitsutoshi Nakamura , Tatsuya Nagase , Motoi Nishimura
- Applicant Address: JP Tokyo
- Assignee: Konica Minolta Business Technologies, Inc.
- Current Assignee: Konica Minolta Business Technologies, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Lucas & Mercanti, LLP
- Priority: JP2007-113917 20070424
- Main IPC: C08F12/08
- IPC: C08F12/08 ; C08J9/16
Abstract:
Disclosed is a method of preparing hollow particles comprising polymerizing a hydrophobic monomer to form a particulate resin exhibiting a number average molecular weight of from 20,000 to 500,000, dispersing the particulate resin in an aqueous medium to form a resin particle dispersion and adding thereto a hydrophobic cross-linkable monomer in an amount of from 0.1 to 50 parts by mass based on 1 part by mass of the particulate resin to polymerize the cross-linkable monomer to form hollow particles.
Public/Granted literature
- US20080269447A1 PREPARATION METHOD OF HOLLOW PARTICLE Public/Granted day:2008-10-30
Information query
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