Invention Grant
- Patent Title: Single electron transistor and method of manufacturing the same
- Patent Title (中): 单电子晶体管及其制造方法
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Application No.: US11905758Application Date: 2007-10-03
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Publication No.: US07955932B2Publication Date: 2011-06-07
- Inventor: Sung-Dae Suk , Kyoung-Hwan Yeo , Ming Li , Yun-Young Yeoh
- Applicant: Sung-Dae Suk , Kyoung-Hwan Yeo , Ming Li , Yun-Young Yeoh
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2006-0097507 20061004
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L31/00

Abstract:
A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the nanowire channel, the oxide channel areas insulating at least one portion of the nanowire channel, a quantum dot in the portion of the nanowire channel insulated by the plurality of oxide channel areas, and a gate electrode surrounding the quantum dot.
Public/Granted literature
- US20080246021A1 Single electron transistor and method of manufacturing the same Public/Granted day:2008-10-09
Information query
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