Invention Grant
US07955932B2 Single electron transistor and method of manufacturing the same 有权
单电子晶体管及其制造方法

Single electron transistor and method of manufacturing the same
Abstract:
A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the nanowire channel, the oxide channel areas insulating at least one portion of the nanowire channel, a quantum dot in the portion of the nanowire channel insulated by the plurality of oxide channel areas, and a gate electrode surrounding the quantum dot.
Public/Granted literature
Information query
Patent Agency Ranking
0/0