Invention Grant
- Patent Title: Field effect transistor with self-aligned source and heavy body regions and method of manufacturing same
- Patent Title (中): 具有自对准源和重体区的场效应晶体管及其制造方法
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Application No.: US12822008Application Date: 2010-06-23
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Publication No.: US07955920B2Publication Date: 2011-06-07
- Inventor: Nathan Kraft
- Applicant: Nathan Kraft
- Applicant Address: US CA San Jose
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US CA San Jose
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
A field effect transistor includes a plurality of trenches extending into a semiconductor region of a first conductivity type. The plurality of trenches include a plurality of gated trenches and a plurality of non-gated trenches. A body region of a second conductivity extends in the semiconductor region between adjacent trenches. A dielectric material fills a bottom portion of each of the gated and non-gated trenches. A gate electrode is disposed in each gated trench. A conductive material of the second conductivity type is disposed in each non-gated trench such that the conductive material and contacts corresponding body regions along sidewalls of the non-gated trench.
Public/Granted literature
- US20100258855A1 Field Effect Transistor with Self-aligned Source and Heavy Body Regions and Method of Manufacturing Same Public/Granted day:2010-10-14
Information query
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