Invention Grant
US07955873B2 Method of fabricating a semiconductor device 有权
制造半导体器件的方法

Method of fabricating a semiconductor device
Abstract:
A method of fabricating a semiconductor device is disclosed. In one embodiment, the method includes providing at least one semiconductor chip including an electrically conductive layer. A voltage is applied to an electrode. The electrode is moved over the electrically conductive layer for growing a metal layer onto the electrically conductive layer.
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