Invention Grant
- Patent Title: Method of forming a micromagnetic device
- Patent Title (中): 形成微磁装置的方法
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Application No.: US11852689Application Date: 2007-09-10
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Publication No.: US07955868B2Publication Date: 2011-06-07
- Inventor: Ashraf W. Lotfi , Trifon M. Liakopoulos , Robert W. Filas , Amrit Panda
- Applicant: Ashraf W. Lotfi , Trifon M. Liakopoulos , Robert W. Filas , Amrit Panda
- Applicant Address: US NJ Hampton
- Assignee: Enpirion, Inc.
- Current Assignee: Enpirion, Inc.
- Current Assignee Address: US NJ Hampton
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of forming a micromagnetic device on a substrate including forming a first insulating layer above the substrate, a first seed layer above the first insulating layer, a first conductive winding layer above the first seed layer, and a second insulating layer above the first conductive winding layer. The method also includes forming a first magnetic core layer above the second insulating layer, a third insulating layer above the first magnetic core layer, and a second magnetic core layer above the third insulating layer. The method still further includes forming a fourth insulating layer above the second magnetic core layer, a second seed layer above the fourth insulating layer, and a second conductive winding layer above the second seed layer and in vias to the first conductive winding layer. The first and second conductive winding layers form a winding for the micromagnetic device.
Public/Granted literature
- US20090068761A1 Method of Forming a Micromagnetic Device Public/Granted day:2009-03-12
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