Invention Grant
- Patent Title: Method for forming fine concavo-convex patterns, method for producing optical diffraction structure, and method for copying optical diffraction structure
- Patent Title (中): 形成微细凹凸图案的方法,光学衍射结构的制造方法以及复制光学衍射结构的方法
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Application No.: US11764266Application Date: 2007-06-18
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Publication No.: US07955785B2Publication Date: 2011-06-07
- Inventor: Hiroshi Funada , Fumihiko Mizukami , Tetsuya Matsuyama
- Applicant: Hiroshi Funada , Fumihiko Mizukami , Tetsuya Matsuyama
- Applicant Address: JP Tokyo-to
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo-to
- Agency: Ladas & Parry LLP
- Priority: JP2003-324608 20030917; JP2003-333170 20030923; JP2003-334750 20030926
- Main IPC: G03H1/26
- IPC: G03H1/26

Abstract:
A method for forming fine concavo-convex patterns by using a relief formation material 3 having a relief formation layer 2 composed of a resin having thermoplasticity and a relief pattern sheet 6 having on a surface thereof fine concavo-convex patterns 5, wherein a photothermal conversion layer 7 is formed in the relief formation material 3 or the relief pattern sheet 6; the photothermal conversion layer 7 is irradiated with light 8 to make the photothermal conversion layer 7 generate heat in the state that the relief formation layer 2 is brought into contact with the fine concavo-convex patterns 5; and the fine concavo-convex patterns 5 are formed on the relief formation layer 2.
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