Invention Grant
- Patent Title: Negative-working photosensitive material and negative-working planographic printing plate precursor
- Patent Title (中): 负性感光材料和负性平版印刷版前体
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Application No.: US12236525Application Date: 2008-09-24
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Publication No.: US07955781B2Publication Date: 2011-06-07
- Inventor: Shigefumi Kanchiku , Toyohisa Oya
- Applicant: Shigefumi Kanchiku , Toyohisa Oya
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-256346 20070928
- Main IPC: G03F7/004
- IPC: G03F7/004

Abstract:
A negative-working photosensitive material is provided which includes: a support; an undercoat layer; and a photosensitive layer including a polymerization initiator, a polymerizable compound, and a binder polymer, wherein the support, the undercoat layer, and the photosensitive layer are sequentially layered, the undercoat layer includes a polymer including a structural unit (a) including at least one of a carboxylic acid or a carboxylic acid salt and a structural unit (b) including at least one carboxylic acid ester; and the content of the structural unit (a) in the polymer is from 30% to 90% by mole. Also, a negative-working planographic printing plate precursor including the negative-working photosensitive material is provided.
Public/Granted literature
- US20090087780A1 NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL AND NEGATIVE-WORKING PLANOGRAPHIC PRINTING PLATE PRECURSOR Public/Granted day:2009-04-02
Information query
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