Invention Grant
US07955765B2 Adjustment method, exposure method, device manufacturing method, and exposure apparatus
失效
调整方法，曝光方法，装置制造方法和曝光装置
- Patent Title: Adjustment method, exposure method, device manufacturing method, and exposure apparatus
- Patent Title (中): 调整方法，曝光方法，装置制造方法和曝光装置
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Application No.: US12177557Application Date: 2008-07-22
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Publication No.: US07955765B2Publication Date: 2011-06-07
- Inventor: Ken-ichiro Shinoda
- Applicant: Ken-ichiro Shinoda
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2007-197849 20070730
- Main IPC: G03F9/00
- IPC: G03F9/00
Abstract:
An adjustment method for adjusting an illumination condition in illuminating an original plate using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate through a projection optical system includes measuring a polarization state of light that has passed through the illumination optical system, the original plate, and the projection optical system in a state where the original plate is located on an object plane of the projection optical system, and adjusting the polarization state based on the measured polarization state.
Public/Granted literature
- US20090035671A1 ADJUSTMENT METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS Public/Granted day:2009-02-05
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