Invention Grant
- Patent Title: Methods to make sidewall light shields for color filter array
- Patent Title (中): 制作滤光片阵列的侧壁灯罩的方法
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Application No.: US11785545Application Date: 2007-04-18
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Publication No.: US07955764B2Publication Date: 2011-06-07
- Inventor: Saijin Liu , Ulrich C. Boettiger
- Applicant: Saijin Liu , Ulrich C. Boettiger
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dickstein Shapiro LLP
- Main IPC: G02B5/20
- IPC: G02B5/20
Abstract:
Methods of forming color filters having a light blocking material therebetween. A color filter is formed such that a trench is defined between a color filter and an adjacent color filter. The trench may be formed by exposing the color filter to polymerizing conditions such as, for example, ultraviolet radiation and heat. The trench may also be formed by etching between adjacent color filters. A material is formed within the trench.
Public/Granted literature
- US20070237888A1 Methods to make sidewall light shields for color filter array Public/Granted day:2007-10-11
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