Invention Grant
- Patent Title: Manufacturing method of liquid discharge head and orifice plate
- Patent Title (中): 排液头和孔板的制造方法
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Application No.: US11855304Application Date: 2007-09-14
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Publication No.: US07955509B2Publication Date: 2011-06-07
- Inventor: Satoshi Nozu
- Applicant: Satoshi Nozu
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-271923 20061003; JP2007-078904 20070326
- Main IPC: B41J2/16
- IPC: B41J2/16

Abstract:
There is disclosed a manufacturing method in which depths of individual liquid chambers can be set to be small. The manufacturing method is a manufacturing method of a liquid discharge head having a liquid chamber which communicates with a discharge port for discharging a liquid, and includes: etching a first Si layer of an SOI substrate by use of an insulating layer as an etching stop layer to form the liquid chamber at the first Si layer, the SOI substrate being constituted by the first Si layer, the insulating layer and a second Si layer in this order; and removing a part or all of the second Si layer.
Public/Granted literature
- US20080081387A1 MANUFACTURING METHOD OF LIQUID DISCHARGE HEAD AND ORIFICE PLATE Public/Granted day:2008-04-03
Information query
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