Invention Grant
- Patent Title: Electrochemical deposition platform for nanostructure fabrication
- Patent Title (中): 用于纳米结构制造的电化学沉积平台
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Application No.: US12034365Application Date: 2008-02-20
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Publication No.: US07955486B2Publication Date: 2011-06-07
- Inventor: Min-Feng Yu , Abhijit P. Suryavanshi
- Applicant: Min-Feng Yu , Abhijit P. Suryavanshi
- Applicant Address: US IL Urbana
- Assignee: The Board of Trustees of the University of Illinois
- Current Assignee: The Board of Trustees of the University of Illinois
- Current Assignee Address: US IL Urbana
- Agency: Greenlee Sullivan P.C.
- Main IPC: C25D5/08
- IPC: C25D5/08

Abstract:
Probe-based methods are provided for formation of one or more nano-sized or micro-sized elongated structures such as wires or tubes. The structures extend at least partially upwards from the surface of a substrate, and may extend fully upward from the substrate surface. The structures are formed via a localized electrodeposition technique. The electrodeposition technique of the invention can also be used to make modified scanning probe microscopy probes having an elongated nanostructure at the tip or conductive nanoprobes. Apparatus suitable for use with the electrodeposition technique are also provided.
Public/Granted literature
- US20090000364A1 ELECTROCHEMICAL DEPOSITION PLATFORM FOR NANOSTRUCTURE FABRICATION Public/Granted day:2009-01-01
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