Invention Grant
- Patent Title: Coating and developing apparatus, substrate processing method, and storage medium
- Patent Title (中): 涂布显影装置,基板处理方法和存储介质
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Application No.: US11733441Application Date: 2007-04-10
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Publication No.: US07955011B2Publication Date: 2011-06-07
- Inventor: Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
- Applicant: Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
- Applicant Address: JP Tokyo-To
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo-To
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-112704 20060414
- Main IPC: G03D5/04
- IPC: G03D5/04

Abstract:
A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
Public/Granted literature
- US20080014333A1 COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM Public/Granted day:2008-01-17
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