Invention Grant
- Patent Title: Group III nitride semiconductor laser
- Patent Title (中): III族氮化物半导体激光器
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Application No.: US12600300Application Date: 2009-02-17
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Publication No.: US07949026B2Publication Date: 2011-05-24
- Inventor: Takashi Kyono , Katsushi Akita , Yusuke Yoshizumi
- Applicant: Takashi Kyono , Katsushi Akita , Yusuke Yoshizumi
- Applicant Address: JP Osaka-shi
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Venable LLP
- Agent Michael A. Sartori; Steven J. Schwarz
- Priority: JP2008-043398 20080225
- International Application: PCT/JP2009/052681 WO 20090217
- International Announcement: WO2009/107516 WO 20090903
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A group III nitride semiconductor laser is provided that has a good optical confinement property and includes an InGaN well layer having good crystal quality.An active layer 19 is provided between a first optical guiding layer 21 and a second optical guiding layer 23. The active layer 19 can include well layers 27a, 27b, and 27c and further includes at least one first barrier layer 29a provided between the well layers. The first and second optical guiding layers 21 and 23 respectively include first and second InGaN regions 21a and 23a smaller than the band gap E29 of the first barrier layer 29a, and hence the average refractive index nGUIDE of the first and second optical guiding layers 21 and 23 can be made larger than the refractive index n29 of the first barrier layer 29a. Thus, good optical confinement is achieved. The band gap E29 of the first barrier layer 29a is larger than the band gaps E21 and E23 of the first and second InGaN regions 21a and 23a.
Public/Granted literature
- US20100189148A1 GROUP III NITRIDE SEMICONDUCTOR LASER Public/Granted day:2010-07-29
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