Invention Grant
- Patent Title: Nonvolatile semiconductor memory and method for driving the same
- Patent Title (中): 非易失性半导体存储器及其驱动方法
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Application No.: US12319770Application Date: 2009-01-12
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Publication No.: US07940573B2Publication Date: 2011-05-10
- Inventor: Fujio Masuoka , Hiroki Nakamura
- Applicant: Fujio Masuoka , Hiroki Nakamura
- Applicant Address: JP Tokyo JP Miyagi
- Assignee: Unisantis Electronics (Japan) Ltd.,Tohoku University
- Current Assignee: Unisantis Electronics (Japan) Ltd.,Tohoku University
- Current Assignee Address: JP Tokyo JP Miyagi
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2006-191469 20060712
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
To provide a NOR-type nonvolatile semiconductor memory that can inject electric charge into a charge accumulation layer through the use of an FN tunnel current without compromising an increase in the packing density of memory cells. The above problem is solved by a nonvolatile semiconductor memory in which nonvolatile semiconductor memory cells are arranged in a matrix, each nonvolatile semiconductor memory cell having an island semiconductor layer in which a drain diffusion layer formed in the upper part of the island semiconductor layer, a source diffusion layer formed in the lower part of the island semiconductor layer, a charge accumulation layer formed on a channel region of the side wall sandwiched between the drain diffusion layer and the source diffusion layer via a gate insulation film, and a control gate formed on the charge accumulation layer are formed. Further, bit lines connected to the drain diffusion layer are laid out in a column direction, control gate lines are laid out in a row direction, and source lines connected to the source diffusion layer are laid out in the column direction.
Public/Granted literature
- US20090161441A1 Nonvolatile semiconductor memory and method for driving the same Public/Granted day:2009-06-25
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