Invention Grant
US07939890B2 Semiconductor device having transistor and capacitor of SOI structure and storing data in nonvolatile manner
有权
具有SOI结构的晶体管和电容器的半导体器件,并且以非易失性方式存储数据
- Patent Title: Semiconductor device having transistor and capacitor of SOI structure and storing data in nonvolatile manner
- Patent Title (中): 具有SOI结构的晶体管和电容器的半导体器件,并且以非易失性方式存储数据
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Application No.: US12155346Application Date: 2008-06-03
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Publication No.: US07939890B2Publication Date: 2011-05-10
- Inventor: Tadaaki Yamauchi
- Applicant: Tadaaki Yamauchi
- Applicant Address: JP Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-161370 20070619
- Main IPC: G11C11/34
- IPC: G11C11/34 ; H01L29/94

Abstract:
In a semiconductor device, a first transistor of an SOI structure has a source region, a drain region, a body region positioned between the source region and the drain region, and a gate electrode positioned above the body region. A first capacitor of the SOI structure has a first terminal electrically connected to a gate electrode of the first transistor, and a second terminal. The semiconductor device stores data in a nonvolatile manner in accordance with carriers accumulated in a first node electrically connecting the gate electrode of the first transistor and the first terminal of the first capacitor.
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