Invention Grant
- Patent Title: Field effect transistor
- Patent Title (中): 场效应晶体管
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Application No.: US12124783Application Date: 2008-05-21
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Publication No.: US07939866B2Publication Date: 2011-05-10
- Inventor: John Stephen Atherton
- Applicant: John Stephen Atherton
- Applicant Address: GB Newton Aycliffe
- Assignee: RFMD (UK) Limited
- Current Assignee: RFMD (UK) Limited
- Current Assignee Address: GB Newton Aycliffe
- Agency: Winthrow & Terranova, P.L.L.C.
- Priority: GB0709706.6 20070521
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A transistor includes a first electrode on a substrate, wherein the first electrode comprises a bus bar and has first and second first electrode fingers extending therefrom, the fingers being spaced apart to define a channel therebetween. The transistor also includes a second electrode on the substrate having a second electrode finger spaced apart from the first electrode and extending along the channel to define a gate region between the fingers. The gate region comprises a “curved” portion beyond the end of the second electrode finger proximate to the bus bar of the first electrode and a gate electrode extends along the gate region, through the “curved” gate portion. The substrate further comprises an active layer beneath the gate region, characterized in that the active layer extends beyond the end of the second electrode finger beneath the “curved” portion of the gate region.
Public/Granted literature
- US20090020793A1 FIELD EFFECT TRANSISTOR Public/Granted day:2009-01-22
Information query
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