Invention Grant
- Patent Title: Solid state imaging device and method for manufacturing the same
- Patent Title (中): 固态成像装置及其制造方法
-
Application No.: US12408291Application Date: 2009-03-20
-
Publication No.: US07939859B2Publication Date: 2011-05-10
- Inventor: Morikazu Tsuno
- Applicant: Morikazu Tsuno
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-133884 20080522
- Main IPC: H01L27/48
- IPC: H01L27/48

Abstract:
A solid state imaging device includes a transfer transistor for transferring signal charges generated by photoelectric conversion to a floating diffusion layer, a reset transistor for resetting a potential of the floating diffusion layer, and an amplifying transistor for outputting a signal corresponding to the potential of the floating diffusion layer. A low concentration impurity region having an impurity concentration lower than that of the first conductivity type semiconductor region is formed in part of a surface portion of the first conductivity type semiconductor region which is located below a gate electrode of the amplifying transistor and serves as a well region of the amplifying transistor.
Public/Granted literature
- US20090289282A1 SOLID STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2009-11-26
Information query