Invention Grant
- Patent Title: Vacuum interrupter chamber
- Patent Title (中): 真空灭弧室
-
Application No.: US12073995Application Date: 2008-03-12
-
Publication No.: US07939777B2Publication Date: 2011-05-10
- Inventor: Edgar Dullni , Dietmar Gentsch , Kurt Kaltenegger
- Applicant: Edgar Dullni , Dietmar Gentsch , Kurt Kaltenegger
- Applicant Address: CH Zurich
- Assignee: ABB Technology AG
- Current Assignee: ABB Technology AG
- Current Assignee Address: CH Zurich
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: DE102005043484 20050913
- Main IPC: H01H33/66
- IPC: H01H33/66

Abstract:
The disclosure relates to a vacuum interrupter chamber having an insulating ceramic wall, within which contact pieces which move in a vacuum are arranged and are surrounded by a screen between the contact piece and the interrupter chamber wall. In order in this case to improve on the one hand the erosion resistance of the screen and on the other hand the dielectric strength of the arrangement, the disclosure proposes that coatings composed of high-melting-point material or composed of refractory metals be fitted at least partially in the area of the screen or other components within the vacuum interrupter chamber.
Public/Granted literature
- US20080203063A1 Vacuum interrupter chamber Public/Granted day:2008-08-28
Information query