Invention Grant
- Patent Title: Composition for forming silica-based coating film
- Patent Title (中): 用于形成二氧化硅基涂膜的组合物
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Application No.: US11911339Application Date: 2006-03-16
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Publication No.: US07939590B2Publication Date: 2011-05-10
- Inventor: Hiroyuki Iida , Masaru Takahama
- Applicant: Hiroyuki Iida , Masaru Takahama
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2005-116281 20050413; JP2005-116282 20050413
- International Application: PCT/JP2006/305291 WO 20060316
- International Announcement: WO2006/112230 WO 20061026
- Main IPC: A61Q19/00
- IPC: A61Q19/00 ; C08J3/07 ; C08J7/00 ; C08K5/54

Abstract:
A composition for forming a silica-based coating film includes a siloxane polymer and an alkali metal compound. The siloxane polymer is preferably a hydrolysis-condensation product of a silane compound having a hydrolyzable group. Sodium, lithium, potassium, rubidium, or cesium, or the like is used as the alkali metal of the alkali metal compound. Furthermore, the alkali metal compound is preferably a nitrate, sulfate, carbonate, oxide, chloride, bromide, fluoride, iodide, or hydroxide of the above alkali metal. This composition for forming a silica-based coating film may also include a pore-forming material. At least one material selected from amongst polyalkylene glycols and alkyl-terminated derivatives thereof is used as the pore-forming material.
Public/Granted literature
- US20090018247A1 COMPOSITION FOR FORMING SILICA-BASED COATING FILM Public/Granted day:2009-01-15
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