Invention Grant
US07929147B1 Method and system for determining an optimized artificial impedance surface
有权
用于确定优化的人造阻抗表面的方法和系统
- Patent Title: Method and system for determining an optimized artificial impedance surface
- Patent Title (中): 用于确定优化的人造阻抗表面的方法和系统
-
Application No.: US12156445Application Date: 2008-05-31
-
Publication No.: US07929147B1Publication Date: 2011-04-19
- Inventor: Bryan H. Fong , Joseph S. Colburn , John Ottusch , Daniel F. Sievenpiper , John L. Visher
- Applicant: Bryan H. Fong , Joseph S. Colburn , John Ottusch , Daniel F. Sievenpiper , John L. Visher
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Tope-McKay & Assoc.
- Main IPC: G01B11/02
- IPC: G01B11/02 ; H01Q15/02 ; H01Q15/24
Abstract:
A method and system for determining an optimized artificial impedance surface is disclosed. An artificial impedance pattern is calculated on an impedance surface using an optical holographic technique given an assumed surface wave profile and a desired far field radiation pattern. Then, an actual surface wave profile produced on the impedance surface from the artificial impedance pattern, and an actual far field radiation pattern produced by the actual surface wave profile are calculated. An optimized artificial impedance pattern is then calculated by iteratively re-calculating the artificial impedance pattern from the actual surface wave profile and the desired far field radiation pattern. An artificial impedance surface is determined by mapping the optimized artificial impedance pattern onto a representation of a physical surface.
Information query
