Invention Grant
- Patent Title: Projection optics for microlithography
- Patent Title (中): 微光刻投影光学
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Application No.: US11969476Application Date: 2008-01-04
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Publication No.: US07929114B2Publication Date: 2011-04-19
- Inventor: Hans-Juergen Mann
- Applicant: Hans-Juergen Mann
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102007003307 20070117
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G02B21/00 ; G02B5/08 ; G02B5/10
Abstract:
A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.
Public/Granted literature
- US20080170216A1 PROJECTION OPTICS FOR MICROLITHOGRAPHY Public/Granted day:2008-07-17
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