Invention Grant
- Patent Title: Apparatus and method for recovering liquid droplets in immersion lithography
- Patent Title (中): 浸没式光刻液液滴回收装置及方法
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Application No.: US11583069Application Date: 2006-10-19
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Publication No.: US07929109B2Publication Date: 2011-04-19
- Inventor: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani
- Applicant: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
Public/Granted literature
- US20070091289A1 Apparatus and method for recovering liquid droplets in immersion lithography Public/Granted day:2007-04-26
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