Invention Grant
- Patent Title: Solid-state imaging device having improved light sensitivity and a method for producing the same
- Patent Title (中): 具有改善的光敏度的固态成像装置及其制造方法
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Application No.: US11331252Application Date: 2006-01-12
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Publication No.: US07929036B2Publication Date: 2011-04-19
- Inventor: Hiroyuki Miyamoto , Tadayuki Dofuku
- Applicant: Hiroyuki Miyamoto , Tadayuki Dofuku
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: SNR Denton US LLP
- Priority: JPP2005-109796 20050127
- Main IPC: H04N5/335
- IPC: H04N5/335

Abstract:
To provide a method for producing a solid-state imaging device enabling an improvement of a light sensitivity characteristic in a light receiving unit, a solid-state imaging device in which the light sensitivity characteristic is improved, and a camera provided with the solid-state imaging device. A shield film projected around the light receiving unit is formed on a substrate in which the light receiving unit is formed; an transparent insulation film is formed on the shield film; a sidewall insulation film is formed by etch-back of the insulation film, in a side wall of the shield film; a mask layer having an aperture at a position corresponding to the light receiving unit is formed on the shield film; and the shield film is etched by using the sidewall insulation film and the mask layer as a mask to form an aperture portion exposing the light receiving unit.
Public/Granted literature
- US20060166389A1 Method for producing solid-state imaging device, solid-state imaging device, and camera Public/Granted day:2006-07-27
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