Invention Grant
US07928447B2 GaN crystal substrate, fabricating method of GaN crystal substrate, and light-emitting device
有权
GaN晶体衬底,GaN晶体衬底的制造方法和发光器件
- Patent Title: GaN crystal substrate, fabricating method of GaN crystal substrate, and light-emitting device
- Patent Title (中): GaN晶体衬底,GaN晶体衬底的制造方法和发光器件
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Application No.: US11487321Application Date: 2006-07-17
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Publication No.: US07928447B2Publication Date: 2011-04-19
- Inventor: Toru Matsuoka , Kensaku Motoki
- Applicant: Toru Matsuoka , Kensaku Motoki
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Main IPC: H01L27/15
- IPC: H01L27/15

Abstract:
A GaN crystal substrate is provided, which has a diameter of not less than 20 mm and a thickness of not less than 70 μm and not more than 450 μm, and has a light absorption coefficient of not less than 7 cm−1 and not more than 68 cm−1 for light in the wavelength range of not less than 375 nm and not more than 500 nm. A fabricating method of the GaN crystal substrate, and a light-emitting device fabricated using the GaN crystal substrate are also provided.
Public/Granted literature
- US20080012025A1 GaN crystal substrate, fabricating method of GaN crystal substrate, and light-emitting device Public/Granted day:2008-01-17
Information query
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