Invention Grant
- Patent Title: Thin film transistor substrate and method of manufacture
- Patent Title (中): 薄膜晶体管基板及其制造方法
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Application No.: US11955252Application Date: 2007-12-12
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Publication No.: US07928437B2Publication Date: 2011-04-19
- Inventor: Kyoung-Ju Shin , Chong-Chul Chai , Mee-Hye Jung
- Applicant: Kyoung-Ju Shin , Chong-Chul Chai , Mee-Hye Jung
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2006-0125950 20061212
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
A thin film transistor (“TFT”) substrate in which the size of a pixel TFT formed in a display area is reduced using a single slit mask, and the length of the channel area of a protection TFT constituting an electrostatic discharge protection circuit formed in a non-display area is formed larger than that of the pixel TFT using the same mask pattern. The TFT substrate includes a signal line and a discharge line formed on a substrate, a signal supply pad formed on one end of the signal line to supply a signal to the signal line, and an electrostatic discharge protection circuit including at least one protection TFT including a plurality of channels formed between the signal supply pad and the discharge line and/or between the signal line and the discharge line.
Public/Granted literature
- US20080135846A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURE Public/Granted day:2008-06-12
Information query
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