Invention Grant
- Patent Title: Nitride-based semiconductor laser device and method of manufacturing the same
- Patent Title (中): 氮化物半导体激光器件及其制造方法
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Application No.: US12415647Application Date: 2009-03-31
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Publication No.: US07885304B2Publication Date: 2011-02-08
- Inventor: Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
- Applicant: Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
- Applicant Address: JP Osaka
- Assignee: Sanyo Electric Co., Ltd.
- Current Assignee: Sanyo Electric Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: JP2008-090124 20080331; JP2009-067213 20090319
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A nitride-based semiconductor laser device includes a nitride-based semiconductor layer formed on a main surface of a substrate and having an emission layer, wherein the nitride-based semiconductor layer includes a first side surface formed by a (000-1) plane and a second side surface inclined with respect to the first side surface, and a ridge having an optical waveguide extending perpendicular to a [0001] direction in an in-plane direction of the main surface of the substrate is formed by a region held between the first side surface and the second side surface.
Public/Granted literature
- US20090245310A1 NITRIDE-BASED SEMICONDUCTOR LASER DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-10-01
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