Invention Grant
- Patent Title: Growth of boron nanostructures with controlled diameter
- Patent Title (中): 具有受控直径的硼纳米结构的生长
-
Application No.: US12413275Application Date: 2009-03-27
-
Publication No.: US07884450B2Publication Date: 2011-02-08
- Inventor: Lisa Pfefferle , Dragos Ciuparu
- Applicant: Lisa Pfefferle , Dragos Ciuparu
- Applicant Address: US CT New Haven
- Assignee: Yale University
- Current Assignee: Yale University
- Current Assignee Address: US CT New Haven
- Agency: Riverside Law, LLP
- Main IPC: H01L39/08
- IPC: H01L39/08 ; H01L39/10

Abstract:
A process for growth of boron-based nanostructures, such as nanotubes and nanowires, with a controlled diameter and with controlled chemical (such as composition, doping) as well as physical (such as electrical and superconducting) properties is described. The boron nanostructures are grown on a metal-substituted MCM-41 template with pores having a uniform pore diameter of less than approximately 4 nm, and can be doped with a Group Ia or Group IIa electron donor element during or after growth of the nanostructure. Preliminary data based on magnetic susceptibility measurements suggest that Mg-doped boron nanotubes have a superconducting transition temperature on the order of 100 K.
Public/Granted literature
- US20090253580A1 Growth of Boron Nanostructures with Controlled Diameter Public/Granted day:2009-10-08
Information query
IPC分类: