Invention Grant
- Patent Title: Solid-state imaging device, production method of the same, and imaging apparatus
- Patent Title (中): 固态成像装置及其制造方法以及成像装置
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Application No.: US12124496Application Date: 2008-05-21
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Publication No.: US07884436B2Publication Date: 2011-02-08
- Inventor: Keiji Mabuchi
- Applicant: Keiji Mabuchi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: SNR Denton US LLP
- Priority: JP2007-138081 20070524
- Main IPC: H01L31/0352
- IPC: H01L31/0352 ; H01L31/113

Abstract:
In a solid-state imaging device, the pixel circuit formed on the first surface side of the semiconductor substrate is shared by a plurality of light reception regions. The second surface side of the semiconductor substrate is made the light incident side of the light reception regions. The second surface side regions of the light reception regions formed in the second surface side part of the semiconductor substrate are arranged at approximately even intervals and the first surface side regions of the light reception regions formed in the first surface side part of the semiconductor substrate are arranged at uneven intervals, respectively, and the second surface side regions and the first surface side regions are joined respectively in the semiconductor substrate so that the light reception regions extend from the second surface side to the first surface side of the semiconductor substrate.
Public/Granted literature
- US20090189234A1 SOLID-STATE IMAGING DEVICE, PRODUCTION METHOD OF THE SAME, AND IMAGING APPARATUS Public/Granted day:2009-07-30
Information query
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