Invention Grant
US07884435B2 Pattern mask for forming microlens, image sensor and fabricating method thereof
失效
用于形成微透镜的图案掩模，图像传感器及其制造方法
- Patent Title: Pattern mask for forming microlens, image sensor and fabricating method thereof
- Patent Title (中): 用于形成微透镜的图案掩模，图像传感器及其制造方法
-
Application No.: US11986916Application Date: 2007-11-26
-
Publication No.: US07884435B2Publication Date: 2011-02-08
- Inventor: Sung Ho Jun
- Applicant: Sung Ho Jun
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: The Law Offices of Andrew D. Fortney
- Agent Andrew D. Fortney
- Priority: KR10-2006-0125279 20061211
- Main IPC: H01L31/0232
- IPC: H01L31/0232
Abstract:
A pattern mask for forming a microlens includes mask pattern parts alternately arranged and corresponding to pixel regions in a matrix, wherein neighboring corners of the mask pattern parts overlap with each other.
Public/Granted literature
- US20080137207A1 Pattern mask for forming microlens, image sensor and fabricating method thereof Public/Granted day:2008-06-12
Information query
IPC分类:
