Invention Grant
US07884430B2 Isolated metal plug process for use in fabricating carbon nanotube memory cells
失效
用于制造碳纳米管记忆单元的隔离金属塞工艺
- Patent Title: Isolated metal plug process for use in fabricating carbon nanotube memory cells
- Patent Title (中): 用于制造碳纳米管记忆单元的隔离金属塞工艺
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Application No.: US12710477Application Date: 2010-02-23
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Publication No.: US07884430B2Publication Date: 2011-02-08
- Inventor: Richard J. Carter , Peter A. Burke , Verne C. Hornback , Thomas Rueckes , Claude L. Bertin
- Applicant: Richard J. Carter , Peter A. Burke , Verne C. Hornback , Thomas Rueckes , Claude L. Bertin
- Applicant Address: US MA Woburn
- Assignee: Nantero, Inc.
- Current Assignee: Nantero, Inc.
- Current Assignee Address: US MA Woburn
- Agency: Wilmer Cutler Pickering Hale and Dorr LLP
- Main IPC: H01L29/84
- IPC: H01L29/84

Abstract:
The present invention is directed to structures and methods of fabricating electromechanical memory cells having nanotube crossbar elements. Such memory cells include a substrate having transistor with a contact that electrically contacts with the transistor. A first support layer is formed over the substrate with an opening that defines a lower chamber above the electrical contact. A nanotube crossbar element is arranged to span the lower chamber. A second support layer is formed with an opening that defines a top chamber above the lower chamber, the top chamber including an extension region that extends beyond an edge of the lower chamber to expose a portion of the top surface of the first support layer. A roof layer covers the top of the top chamber and includes an aperture that exposes a portion of the extension region of the top chamber and includes a plug that extends into the aperture in the roof layer to seal the top and bottom chambers. The memory cell further includes an electrode that overlies the crossbar element such that electrical signals can activate the electrode to attract or repel the crossbar element to set a memory state for the transistor.
Public/Granted literature
- US20100148277A1 ISOLATED METAL PLUG PROCESS FOR USE IN FABRICATING CARBON NANOTUBE MEMORY CELLS Public/Granted day:2010-06-17
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