Invention Grant
- Patent Title: Method of patterning nano conductive film
- Patent Title (中): 纳米导电膜图案方法
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Application No.: US11394085Application Date: 2006-03-31
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Publication No.: US07884356B2Publication Date: 2011-02-08
- Inventor: Jong-Jin Park , Myeong-Suk Kim , Tae-Yong Noh , Sung-Hun Lee , Sang-Yoon Lee , Eun-Jeong Jeong
- Applicant: Jong-Jin Park , Myeong-Suk Kim , Tae-Yong Noh , Sung-Hun Lee , Sang-Yoon Lee , Eun-Jeong Jeong
- Applicant Address: KR Giheung-Gu, Yongin, Gyunggi-Do
- Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee Address: KR Giheung-Gu, Yongin, Gyunggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2005-0052721 20050618
- Main IPC: H01L35/24
- IPC: H01L35/24 ; H01L51/00

Abstract:
A donor substrate for forming a nano conductive film includes a base substrate and a transferring layer that is disposed on the base substrate. The transferring layer includes nano conductive particles and an organic semiconductor. A method of patterning a nano conductive film is provided, wherein a donor substrate in which nano conductive particles are dispersed by employing an organic semiconductor having low molecular weight as a binder is prepared, and nano conductive particles are patterned on a receptor substrate by employing the donor substrate. The method can be used to prepare patterns of various devices including a display device such as an OLED and an OTFT. Such a device can be prepared simply and economically by preparing a device comprising nano conductive particles and an organic semiconductor in wet basis even without deposition.
Public/Granted literature
- US20060284169A1 Method of patterning nano conductive film Public/Granted day:2006-12-21
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