Invention Grant
- Patent Title: Phase-change memory device and method of fabricating the same
- Patent Title (中): 相变存储器件及其制造方法
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Application No.: US12425152Application Date: 2009-04-16
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Publication No.: US07884347B2Publication Date: 2011-02-08
- Inventor: Sung Min Yoon , Byoung Gon Yu , Soon Won Jung , Seung Yun Lee , Young Sam Park , Joon Suk Lee
- Applicant: Sung Min Yoon , Byoung Gon Yu , Soon Won Jung , Seung Yun Lee , Young Sam Park , Joon Suk Lee
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Priority: KR10-2008-0069493 20080717
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
A phase-change memory device in which a phase-change material layer has a multilayered structure with different compositions and a method of fabricating the same are provided. The phase-change memory device includes a first electrode layer formed on a substrate, a heater electrode layer formed on the first electrode layer, an insulating layer formed on the heater electrode layer and having a pore partially exposing the heater electrode layer, a phase-change material layer formed to fill the pore and partially contacting the heater electrode layer, and a second electrode layer formed on the phase-change material layer. The main operating region functioning as a memory operating region is formed of a Ge2Sb2+xTe5 phase-change material to ensure the stability of a memory operation, and simultaneously, the subsidiary regions formed of a Ge2Sb2Te5 phase-change material are disposed respectively on and under the Ge2Sb2+xTe5 main operating region to prevent leakage of thermal energy through an electrode, thereby reducing power consumption.
Public/Granted literature
- US20100012915A1 PHASE-CHANGE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2010-01-21
Information query
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