Invention Grant
- Patent Title: Scanning electron microscope and a method for pattern composite inspection using the same
- Patent Title (中): 扫描电子显微镜和使用其的图案复合检查方法
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Application No.: US11976968Application Date: 2007-10-30
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Publication No.: US07884322B2Publication Date: 2011-02-08
- Inventor: Fumihiro Sasajima , Saori Kato
- Applicant: Fumihiro Sasajima , Saori Kato
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-296062 20061031
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00 ; G06K9/00

Abstract:
A scanning electron microscope capable of performing alone the critical dimension measurement and the defect inspection is provided. The scanning electron microscope has a reference image storage unit for storing a reference image transcribing a reference pattern, an inspected image pick-up unit for picking up, on the basis of the reference image, an inspected image transcribing an inspection pattern which pattern-matches with the reference pattern, a critical dimension measuring unit for measuring critical dimensions of the inspection pattern by using the inspected image, and a defect inspection unit for performing an inspection of a defect inside or outside the inspection pattern by comparing the reference image with the inspected image.
Public/Granted literature
- US20080099676A1 Scanning electron microscope and a method for pattern composite inspection using the same Public/Granted day:2008-05-01
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