Invention Grant
- Patent Title: Laser thin film poly-silicon annealing optical system
- Patent Title (中): 激光薄膜多晶硅退火光学系统
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Application No.: US11201877Application Date: 2005-08-11
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Publication No.: US07884303B2Publication Date: 2011-02-08
- Inventor: William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
- Applicant: William N. Partlo , Palash P. Das , Russell Hudyma , Michael Thomas
- Applicant Address: US CA San Diego
- Assignee: TCZ LLC
- Current Assignee: TCZ LLC
- Current Assignee Address: US CA San Diego
- Agency: Procopio Cory Hargreaves & Savitch LLP
- Agent Noel C. Gillespie
- Main IPC: B23K26/00
- IPC: B23K26/00

Abstract:
A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.
Public/Granted literature
- US20050269300A1 Laser thin film poly-silicon annealing optical system Public/Granted day:2005-12-08
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