Invention Grant
- Patent Title: Method for preparing anisotropic silica aggregates
- Patent Title (中): 制备各向异性二氧化硅聚集体的方法
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Application No.: US10563792Application Date: 2004-07-07
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Publication No.: US07884153B2Publication Date: 2011-02-08
- Inventor: Lionel Ventelon , Julien Hernandez , Françoise Lafuma , Christophe Chassenieux , Christelle Perreur
- Applicant: Lionel Ventelon , Julien Hernandez , Françoise Lafuma , Christophe Chassenieux , Christelle Perreur
- Applicant Address: FR Aubervilliers FR Paris
- Assignee: Rhodia Chimie,C.N.R.S.
- Current Assignee: Rhodia Chimie,C.N.R.S.
- Current Assignee Address: FR Aubervilliers FR Paris
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: FR0308467 20030710
- International Application: PCT/FR2004/001763 WO 20040707
- International Announcement: WO2005/007574 WO 20050127
- Main IPC: C08K3/36
- IPC: C08K3/36 ; C01B33/18

Abstract:
The invention concerns a method for preparing anisotropic silica aggregates comprising the following steps: a) contacting at least one polymer with non-aggregated silica particles and/or highly dispersed in an aqueous medium, with a ratio R, polymer weight to silica particle surface, ranging between 0.03 and 2 mg/m; 2; and whereof the electrostatic value of the silica particle surface is not less than the value of the charge of the silica particle surface measured in an aqueous phase without added salts at a pH not less than 7; b) consolidating the aggregates obtained at step a) either by heat treatment, or by precipitation of a mineral compound. The invention also concerns a silica aggregate comprising a chaining of elementary particles whereof the number of particles ranges between 5 and 15, whereof 80% of elementary particles are in contact with not more than 2 particles and whereof the greatest distance measurable between 2 points of the aggregate is not more than 5 times the average size of one elementary particle.
Public/Granted literature
- US20070219305A1 Method for Preparing Anisotropic Silica Aggregates Public/Granted day:2007-09-20
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