Invention Grant
- Patent Title: Method for manufacturing semiconductor substrate
- Patent Title (中): 半导体衬底的制造方法
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Application No.: US12469060Application Date: 2009-05-20
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Publication No.: US07883988B2Publication Date: 2011-02-08
- Inventor: Koichiro Tanaka
- Applicant: Koichiro Tanaka
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2008-146914 20080604
- Main IPC: H01L21/30
- IPC: H01L21/30

Abstract:
One surface of a single crystal semiconductor substrate is irradiated with ions to form a damaged region in the single crystal semiconductor substrate. An insulating layer is formed over the one surface of the single crystal semiconductor substrate. A surface of a substrate having an insulating surface and a surface of the insulating layer are disposed in contact with each other to bond the substrate having the insulating surface and the single crystal semiconductor substrate to each other. Heat treatment is performed to divide the single crystal semiconductor substrate along the damaged region and to form a semiconductor layer over the substrate having the insulating surface. One surface of the semiconductor layer is irradiated with light from a flash lamp under conditions where the semiconductor layer is not melted, to repair a defect.
Public/Granted literature
- US20090305483A1 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE Public/Granted day:2009-12-10
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