Invention Grant
- Patent Title: Image sensor and method for manufacturing an image sensor
- Patent Title (中): 图像传感器和图像传感器的制造方法
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Application No.: US12204831Application Date: 2008-09-05
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Publication No.: US07883920B2Publication Date: 2011-02-08
- Inventor: Joon Hwang
- Applicant: Joon Hwang
- Applicant Address: KR Seoul
- Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Saliwanchik
- Priority: KR10-2007-0090293 20070906; KR10-2007-0091083 20070907; KR10-2008-0065719 20080707
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Provided are methods for manufacturing an image sensor. A method for manufacturing an image sensor can include: forming a readout circuitry on a substrate; forming an electrical junction region in the substrate; forming an interconnection connected to the electrical junction region; and forming an image sensing device on the interconnection. The readout circuitry can be formed on a first substrate. The electrical junction region can be formed in the first substrate to electrically connect the image sensing device with the readout circuitry. The image sensing device can be formed using a second substrate that is then bonded on the interconnection.
Public/Granted literature
- US20090065822A1 Image Sensor and Method for Manufacturing an Image Sensor Public/Granted day:2009-03-12
Information query
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