Invention Grant
- Patent Title: Method for cleaning foreign materials filtering apparatus
- Patent Title (中): 异物清洗方法
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Application No.: US12041914Application Date: 2008-03-04
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Publication No.: US07882715B2Publication Date: 2011-02-08
- Inventor: Sang-Hee Yoo , Jong-Deuk Bae , Bo-Young Chang , Young-Bae Park , Ji-Maeng Kim , Soo-Jin Jung , Ae-Na Jo
- Applicant: Sang-Hee Yoo , Jong-Deuk Bae , Bo-Young Chang , Young-Bae Park , Ji-Maeng Kim , Soo-Jin Jung , Ae-Na Jo
- Applicant Address: KR Seoul
- Assignee: LG Electronics Inc.
- Current Assignee: LG Electronics Inc.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2007-0022175 20070306
- Main IPC: D06F39/10
- IPC: D06F39/10

Abstract:
In a method for cleaning the foreign materials filtering, foreign materials collected in a foreign materials filtering space can be easily removed under a filter unit is separated from or is mounted at a filter cover unit. As a result, can be solved the conventional problems that a net filter has to be kept inside out at the time of a cleaning process to cause a user's hands to become dirty, and there is a difficulty in removing foreign materials from the net filter due to a fibrous characteristic of the net filter. Accordingly, a cleaning operation for the foreign materials filtering apparatus can be facilitated.
Public/Granted literature
- US20080217243A1 METHOD FOR CLEANING FOREIGN MATERIALS FILTERING APPARATUS Public/Granted day:2008-09-11
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